Evaluation of 300 mm wafer boxes with UV/photoelectron cleaning capability
説明
New plastic wafer boxes with cleaning capability for gaseous contamination harmful to LSI fabrication processes have been developed. The contamination gases are effectively reduced by attaching a UV/photoelectron cleaning unit to the conventional polycarbonate plastic box. The performance of the wafer boxes has been verified by a reliability test of thin gate oxides fabricated on Si wafers stored in the boxes. It is also shown that a newly developed plastic material is superior to polycarbonate in terms of the organic molecule contaminants.
収録刊行物
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- 1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314)
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1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314) 169-172, 2003-01-20
IEEE