Synthesis and patterning of 2 to 10-nm pinhole-free organic films
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説明
Ultrathin films in the thickness range of 2-10 nm were deposited by plasma polymerization. An AFM (atomic force microscope) was used to evaluate the film surface uniformity. The measured surface roughness of these films is of the order of 0.1 to 0.3 nm. It suggests that uniformly smooth, pinhole free ultra thin film organic films suitable for electronic applications can be deposited by plasma polymerization. The deposited films were tested for nanometer scale patterning using an atomic force microscope. Process of contact electrification was used to deposit local electric charge on these surface enhanced reactions with some adsorbates thus creating patterns.
収録刊行物
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- SPIE Proceedings
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SPIE Proceedings 2195 849-, 1994-05-16
SPIE
