Relationship between hardness and lattice parameter for TiN films deposited on SUS 304 by an IBAD technique

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Abstract Titanium nitride films were deposited on SUS 304 stainless steel using an ion beam-assisted deposition technique. The N ions were accelerated at energy of 0.5–2.0 keV with an intensity of 0.1 mA/cm 2 on the substrate. Substrates were held at temperatures of 400–770 °C during deposition. For the TiN films, hardness was in the range from 350 to 550 GPa, depending on the N ion-beam energy, while the lattice parameter was dependent on the N ion-beam energy and substrate temperature. The lattice parameter dependence of hardness for the TiN films deposited at temperatures lower than 600 °C differed from that for films deposited at temperatures above 700 °C.

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