Optical coupling between SiO<inf>x</inf>N<inf>y</inf> waveguide and Ge mesa structures for bulk-Si photonics platform

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We successfully confirmed controllable optical coupling between a germanium mesa on a bulk-silicon wafer and a low-loss silicon oxynitride waveguide. This coupling structure can be adopted for constructing various active devices on a CMOS-process-friendly bulk-silicon photonics platform.

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