Heat transfer analysis of two wavelengths laser microprocessing inside glass

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We investigated the relationship between size of melting marks formed inside glass and irradiation time and absorptivity of femtosecond laser beam. For this investigation the absorptivities for static exposure in fs-laser processing (femtosecond laser microprocessing inside glass) was estimated to approximately 4.5 [%]. Also the size of melting marks formed by fs-laser processing was measured with two irradiation times (1/125 [s] and 1/4 [s]). The sizes were much the same. Thus, in this time scale, the size was nearly independent of the irradiation time. Furthermore, luminescence phenomenon that occurred in fs-laser processing was observed. The duration of this luminescence was less than 2/1000 [s]. With the above experimental results, we demonstrated numerical heat transfer analysis during the fs-laser processing. From the experimental and numerical results it thought that the most process in fs-laser processing finishes within 2/1000 [s].

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