Microwave absorption of ε-Fe2O3 precipitated from sputter deposited Fe–Si–O amorphous thin film by thermal annealing
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説明
Abstract Granular magnetic thin films were prepared by thermal annealing of rf-sputter-deposited Fe–Si–O amorphous films. The particle size of the precipitated Fe 2 O 3 was controlled to obtain a pure e-phase by adjusting the target chemical composition to an atomic ratio SiO 2 /Fe 2 O 3 =2 and annealing for 1 to 3 h at 900 °C. For a film annealed for 100 min, an almost symmetrical ferromagnetic resonance signal was observed, with no evidence of residual ferric ions in the amorphous silica matrix.
収録刊行物
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- Materials Letters
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Materials Letters 115 198-200, 2014-01-01
Elsevier BV
