Photonic crystal switch by inserting nano-crystal defects using MEMS actuator

説明

A novel photonic crystal switch by inserting crystal defects using a MEMS actuator was proposed. Optical parameters for obtaining photonic crystal switch were determined. The number of air holes necessary for light switching, and allowable gaps between the air hole and silicon rod, were decided by a FDTD simulation. The fabrication techniques using electron beam lithography, fast atom beam etching and HF gas-phase etching were proposed.

収録刊行物

詳細情報 詳細情報について

問題の指摘

ページトップへ