この論文をさがす
説明
A new type of ion implanter developed for an agile fab can eliminate the processes concerned. with photoresist lithography from the ion implantation process. This new ion implantation technology can reduce the raw process time, footprint, and the cost of ownership to less than one-half that of conventional ion implantation technology. The authors are making further developments on this ion implanter and evaluating technical issues related to ion implantation. This technique is suitable for manufacturing submicron node IC devices. Based on the results of evaluating the prototype machine, we will produce the next /spl beta/-machine.
収録刊行物
-
- IEEE Transactions on Semiconductor Manufacturing
-
IEEE Transactions on Semiconductor Manufacturing 15 464-469, 2002-11-01
Institute of Electrical and Electronics Engineers (IEEE)