Structure-Disorder induced Magneto-Resistance intensification on spin-dependent-conduction in magnetite (Fe<sub>3</sub>O<sub>4</sub>) thin film produced by RF magnetron sputtering method

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The intensification of magneto-resistance (MR) caused by structure-disorder has been observed in magnetite (Fe3O4) thin film (MTF) produced by the rf magnetron sputtering method. The MTFs with the thickness of 20nm, 50nm and 100nm were deposited on the substrates of SiO2-glass, MgAl2O4 (100) and MgO (100) single crystals. We have observed that the MR of the MTF on SiO2-glass substrate changes 3–5 times larger than that of the MTFs on MgAl2O4 and MgO substrates. From the AFM, SEM and XRD measurements, we have found that the MTFs are composed of magnetite nano-particles (MNPs) and the crystal-axis directions of the MNPs in the MTF on SiO2-glass are mutually random and those of the MTFs on MgAl2O4 and MgO are almost aligned along (100) direction. In addition, from the electrical and magnetization measurements, we have found that the MNPs in the MTF on SiO2-glass show the amorphous-like behavior and those of the MTFs on MgAl2O4 and MgO indicate the crystal-like behavior.

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