Electrostatically-tunable infrared filter that uses etched thin Si plates

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説明

We fabricated infrared Fabry-Perot filters by stacking two wet-etched Si plates. When an electric voltage was applied between the plates, the spacing between the plates changed due to an electrostatic force, which caused a shift of interference peaks. The Si plates were etched in a KOH solution to 34-μm thickness in order to reduce the driving voltage. When the voltage was raised from 0 to 20 V, an interference peak shifted from 7.9- to 5.5-μm wavelength, corresponding to the decrease in the spacing from 7.9 to 5.5 μm. The peak transmittance increased to 91% by an antireflection coating on the outer surface of the filter. This coating was effective to suppress the interference inside the Si plates that created a complicated spectrum.

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詳細情報 詳細情報について

  • CRID
    1873961342645399168
  • DOI
    10.1117/12.647503
  • ISSN
    0277786X
  • データソース種別
    • OpenAIRE

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