Fab-wide equipment monitoring and FDC system
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説明
This paper describes development and actual utilization of a fab-wide equipment monitoring system using a secondary port separating a primary port shared by an MES and a fab-wide FDC (fault detection and classification) system. In data collection of equipment parameter, a new concept of important parameter is introduced. As an example of the fab-wide FDC, an FDC of a slurry flow rate fault in CMP equipment from the start-up is demonstrated. Moreover, in order to quantitatively estimate equipment quality, Cpk for each parameter of equipment in fab-wide is calculated and it is confirmed that equipment quality is increasing from starting up equipment.
収録刊行物
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- 2006 IEEE International Symposium on Semiconductor Manufacturing
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2006 IEEE International Symposium on Semiconductor Manufacturing 114-117, 2006-09-01
IEEE