Self-Affine Fractal of Porous Silicon Surfaces before and after Natural Oxidization

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Atomic force microscopy was used to measure the morphological changes of the porous silicon surfaces in ambient atmosphere. The rough surfaces were quantitatively analyzed using the fractal theory. The morphology of the porous silicon surface oxidized in the environment for three days was found to retain the same self-affine fractal character as the fresh samples. The roughness exponent of aged samples, which characterizes the spatial scale of the surface roughness, was α = 0.64 ± 0.04 and fractal dimensions D = 2.36 ± 0.04, while those of fresh samples were α = 0.53–0.64 and D = 2.36–2.47. However, a growth exponent β, which is another fractal exponent and characterizes the time-dependent dynamics of the roughening process, was lost in the aged samples.

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