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Atomic-layer-deposited silicon-nitride/SiO_2 stack - a highly potential gate dielectrics for advanced CMOS technology (Introductory Invited)
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- NAKAJIMA Anri
- Hiroshima University, Research Center for Nanodevices and Systems, Associate Professor
Bibliographic Information
- Title
- Atomic-layer-deposited silicon-nitride/SiO_2 stack - a highly potential gate dielectrics for advanced CMOS technology (Introductory Invited)
- Author
- Anri Nakajima
Journal
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- Microelectronics Reliability 42
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Microelectronics Reliability 42 1823-1835, 2002
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Details 詳細情報について
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- CRID
- 1010000781759534728
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- Article Type
- journal article
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- Data Source
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- KAKEN