Effect of Post-Annealing in Nitrogen Gas on the Microstructure of ZnO Thin Films Prepared Using Atmospheric Pressure Cold Plasma
書誌事項
- タイトル
- Effect of Post-Annealing in Nitrogen Gas on the Microstructure of ZnO Thin Films Prepared Using Atmospheric Pressure Cold Plasma
収録刊行物
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- Frontier of Applied Plasma Technology
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Frontier of Applied Plasma Technology 9 61-65, 2016