Generation of Solid-Source H_2O Plasma and Its Application to Dry Etching of CaF_2
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- MATSUTANI Akihiro
- Tokyo Institute of Technology
Bibliographic Information
- Title
- Generation of Solid-Source H_2O Plasma and Its Application to Dry Etching of CaF_2
- Author
- Akihiro Matsutani, Hideo Ohtsuki, Fumio Koyama
Journal
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- Japanese Journal of Applied Physics 47(In press)
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Japanese Journal of Applied Physics 47(In press) 2008
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Details 詳細情報について
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- CRID
- 1010000781980380673
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- Article Type
- journal article
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- Data Source
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- KAKEN