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Hexagonality and stacking sequence dependence of etching properties in Cl_2-O_2-SiC system
Bibliographic Information
- Title
- Hexagonality and stacking sequence dependence of etching properties in Cl_2-O_2-SiC system
- Author
- T.Hatayama, 他3名
Journal
-
- Mat.Sci.Forum 645巻
-
Mat.Sci.Forum 645巻 771-774, 2010
- Tweet
Details 詳細情報について
-
- CRID
- 1010000782045205249
-
- Article Type
- journal article
-
- Data Source
-
- KAKEN
