Influence of sputtering parameters on the crystallinity and crystal orientation of AIN layers deposited by RF sputtering using the AIN target
書誌事項
- タイトル
- Influence of sputtering parameters on the crystallinity and crystal orientation of AIN layers deposited by RF sputtering using the AIN target
- 著者
- Z.Vashaei
収録刊行物
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- Journal of Crystal Growth 311
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Journal of Crystal Growth 311 459-462, 2009
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詳細情報
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- CRID
- 1010000782053706639
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- 資料種別
- journal article
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- データソース種別
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- KAKEN