On the Interface Flattening Effect and Gate Insulator Breakdown Characteristic of Radical Reaction Based Insulator Formation Technology

Bibliographic Information

Title
On the Interface Flattening Effect and Gate Insulator Breakdown Characteristic of Radical Reaction Based Insulator Formation Technology
Author
R. Kuroda, A. Teramoto, X. Li, T. Suwa, S. Sugawa, and T. Ohmi

Journal

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Details

  • CRID
    1010000782138811138
  • Article Type
    journal article
  • Data Source
    • KAKEN

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