Characteristics of Antisticking Layer Formed by CHF_3 Plasma Irradiation for Nanoimprint Molds
書誌事項
- タイトル
- Characteristics of Antisticking Layer Formed by CHF_3 Plasma Irradiation for Nanoimprint Molds
- 著者
- M.Okada, K.Nakamatsu, Y.Kang, K.Kanda, Y.Haruyama, S.Matsui
収録刊行物
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- Jpn.J.Appl.Phys. 48
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Jpn.J.Appl.Phys. 48 2009