50 nm gate electrode patterning using a neutral-beam etching system
Bibliographic Information
- Title
- 50 nm gate electrode patterning using a neutral-beam etching system
- Author
- 野田周一
Journal
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- Journal of Vacuum Science and Technology A22・4
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Journal of Vacuum Science and Technology A22・4 1506-1512, 2004
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Details 詳細情報について
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- CRID
- 1010282256781795587
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- Article Type
- journal article
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- Data Source
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- KAKEN