Plasma etching of high-κ and metal gate materials
Bibliographic Information
- Title
- Plasma etching of high-κ and metal gate materials
- Author
- K.Nakamura, T.Kitagawa, K.Osari, K.Takahashi, K.Ono
Journal
-
- Vacuum Vol.80,No.7
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Vacuum Vol.80,No.7 761-767, 2006
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Details
-
- CRID
- 1010282256909725581
-
- Article Type
- journal article
-
- Data Source
-
- KAKEN
