A comparison of diamond growth rate using in-liquid and conventional plasma chemical vapor deposition methods
書誌事項
- タイトル
- A comparison of diamond growth rate using in-liquid and conventional plasma chemical vapor deposition methods
- 著者
- Yoshiyuki Takahashi, Hiromichi Toyota, Shinfuku Nomura, Shinobu Mukasa, Toru Inoue
収録刊行物
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- JOURNAL OF APPLIED PHYSICS 105
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JOURNAL OF APPLIED PHYSICS 105 2009
