Plasma chemical behaviour of reactants and reaction products during inductively coupled C_F4 plasma Etching of SiO_2

Bibliographic Information

Title
Plasma chemical behaviour of reactants and reaction products during inductively coupled C_F4 plasma Etching of SiO_2
Author
H.Fukumoto, I.Fujikake, Y.Takao, K.Eriguchi, K.Ono

Journal

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Details 詳細情報について

  • CRID
    1010282257047008908
  • Article Type
    journal article
  • Data Source
    • KAKEN

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