2,990,000 Yen
(Direct Cost: 2,300,000 Yen Indirect Cost: 690,000 Yen)
Research Abstract
This work is aimed at obtaining the guideline to avoid /suppress the so-called "striation" which is radial spoke-like thickness undulation generated during spin-coating of resist films, by elucidating the formation mechanism thereof. From the linear stability analysis, time evolution calculation, and real-time measurement of film thickness change during spin coating, the formation mechanism of striation is a derivative form of the well-known solutal Marangoni-Benard instability. As a guideline for the solvent selection, solvents of low vapor pressure and/or small surface-tension difference are preferable. In addition, it was found that adjusting an initial concentration could suppress the striation.
