Effect of wet or dry process MA method for Synthesis of Iron Silicide Thermoelectoric Semiconductor

IR

Bibliographic Information

Other Title
  • 鉄シリサイド系熱電半導体の合成におけるMA処理の湿式/乾式の影響

Journal

Details 詳細情報について

  • CRID
    1050564287895647232
  • NII Article ID
    120006552755
  • ISSN
    21883688
  • Web Site
    https://sasebo.repo.nii.ac.jp/records/866
  • Text Lang
    ja
  • Article Type
    departmental bulletin paper
  • Data Source
    • IRDB
    • CiNii Articles

Report a problem

Back to top