Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
CiNii
Available at 2 libraries
Bibliographic Information
- Title
- "Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California"
- Statement of Responsibility
- Neal T. Sullivan chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI-Semiconductor Equipment and Materials International SEMATECH
- Publisher
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- SPIE
- Publication Year
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- c2000
- Book size
- 28 cm
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Notes
Includes bibliographical references and index
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Details 詳細情報について
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- CRID
- 1130000794245283968
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- NII Book ID
- BA60711510
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- ISBN
- 081943616X
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- Text Lang
- en
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- Country Code
- us
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- Title Language Code
- en
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- Place of Publication
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- Bellingham, Wash.
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- Data Source
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- CiNii Books