Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
Bibliographic Information
- Title
- "Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA"
- Statement of Responsibility
- John L. Sturtevant, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering, AZ Electronic Materials (USA), Rohm and Haas Electronic Materials (USA) ; cooperating organization, International SEMATECH ; published by SPIE--the International Society for Optical Engineering.
- Publisher
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- SPIE
- Publication Year
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- c2005
- Book size
- 28 cm
- Series Name / No
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- pt. 1
- pt. 2
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Notes
Includes bibliographical references and author index
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Details 詳細情報について
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- CRID
- 1130000794264546560
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- NII Book ID
- BA85951627
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- ISBN
- 0819457337
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- LCCN
- 2006295072
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- Web Site
- https://lccn.loc.gov/2006295072
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- Text Lang
- en
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- Country Code
- us
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- Title Language Code
- en
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- Place of Publication
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- Bellingham, Wash.
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- Classification
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- LCC: TK7874
- DC22: 621.3815/31
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- Subject
-
- Data Source
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- CiNii Books