Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA

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Bibliographic Information

Title
"Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA"
Statement of Responsibility
John L. Sturtevant, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering, AZ Electronic Materials (USA), Rohm and Haas Electronic Materials (USA) ; cooperating organization, International SEMATECH ; published by SPIE--the International Society for Optical Engineering.
Publisher
  • SPIE
Publication Year
  • c2005
Book size
28 cm
Series Name / No
  • pt. 1
  • pt. 2

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Notes

Includes bibliographical references and author index

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