Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California
Bibliographic Information
- Title
- "Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California"
- Statement of Responsibility
- Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering
- Publisher
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- The Society
- Publication Year
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- c1988
- Book size
- 28 cm
- Series Name / No
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- pbk.
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Notes
Includes bibliographies and index
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Details 詳細情報について
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- CRID
- 1130000794416409600
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- NII Book ID
- BA07915758
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- ISBN
- 089252958X
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- LCCN
- 88060782
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- Web Site
- https://lccn.loc.gov/88060782
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- Text Lang
- en
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- Country Code
- us
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- Title Language Code
- en
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- Place of Publication
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- Bellingham, Wash., USA
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- Classification
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- LCC: TK7874
- DC19: 621.381/73
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- Subject
-
- Data Source
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- CiNii Books