Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California

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Bibliographic Information

Title
"Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California"
Statement of Responsibility
Arnold W. Yanof, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering
Publisher
  • SPIE
Publication Year
  • c1989
Book size
28 cm

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Notes

Proceedings of the SPIE Symposium on Microlithography

Includes bibliographical references

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