Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues
書誌事項
- タイトル
- "Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues"
- 責任表示
- editors, S. Kar ... [et al.] ; sponsoring divisions: Dielectric Science and Technology, Electronics
- 出版者
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- Electrochemical Society
- 出版年月
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- c2003-c2004
- 書籍サイズ
- 24 cm
- シリーズ名/番号
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- [I]
- II
この図書・雑誌をさがす
注記
1st: Held in Salt Lake City, Utah, October 20-24, 2004
2nd: Held in Orlando, Florida, October 12-17, 2003
Includes bibliographical references and indexes
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詳細情報 詳細情報について
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- CRID
- 1130000795680707968
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- NII書誌ID
- BA69504479
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- ISBN
- 1566773954
- 1566774055
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- LCCN
- 2004100366
- 2003109748
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- 本文言語コード
- en
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- 出版国コード
- us
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- タイトル言語コード
- en
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- 出版地
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- Pennington, NJ
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- 分類
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- LCC: TK7872.D53
- DC21: 537/.24
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- 件名
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- データソース種別
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- CiNii Books