Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues

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Bibliographic Information

Title
"Physicas and technology of high-k gate dielectrics : proceedings of the International Symposium on High Dielectric Constant Materials : Materials Science, Processing, and Reliability, and Manufacturing Issues"
Statement of Responsibility
editors, S. Kar ... [et al.] ; sponsoring divisions: Dielectric Science and Technology, Electronics
Publisher
  • Electrochemical Society
Publication Year
  • c2003-c2004
Book size
24 cm
Series Name / No
  • [I]
  • II

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Notes

1st: Held in Salt Lake City, Utah, October 20-24, 2004

2nd: Held in Orlando, Florida, October 12-17, 2003

Includes bibliographical references and indexes

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