Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California

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Bibliographic Information

Title
"Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California"
Statement of Responsibility
Bhanwar Singh chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI-Semiconductor Equipment and Materials International SEMATECH
Publisher
  • SPIE
Publication Year
  • c1998
Book size
28 cm

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Notes

Includes bibliographical references and index

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Details 詳細情報について

  • CRID
    1130000795891924608
  • NII Book ID
    BA37526890
  • ISBN
    0819427772
  • Text Lang
    en
  • Country Code
    us
  • Title Language Code
    en
  • Place of Publication
    • Bellingham, Wash., USA
  • Data Source
    • CiNii Books
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