Advances in resist technology and processing XI : 28 February-1 March 1994, San Jose, California

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Bibliographic Information

Title
"Advances in resist technology and processing XI : 28 February-1 March 1994, San Jose, California"
Statement of Responsibility
Omkaram Nalamasu chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering
Publisher
  • SPIE
Publication Year
  • c1994
Book size
28 cm

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Notes

Includes bibliographical references and index

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Details 詳細情報について

  • CRID
    1130000796921007104
  • NII Book ID
    BA27423643
  • ISBN
    0819414905
  • Text Lang
    en
  • Country Code
    us
  • Title Language Code
    en
  • Place of Publication
    • Bellingham, Wash., USA
  • Data Source
    • CiNii Books
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