Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California

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Bibliographic Information

Title
"Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California"
Statement of Responsibility
chair/editor Will Conley ; sponsored and published by SPIE--the International Society for Optical Engineering
Publisher
  • SPIE
Publication Year
  • c1999
Book size
28 cm
Series Name / No
  • : set
Other Title
  • Advances in resist technology and processing XVI : microlithography 1999 : 15-17 March 1999, Santa Clara, California

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Notes

Includes bibliographical references and index

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Details 詳細情報について

  • CRID
    1130000797087699072
  • NII Book ID
    BA45995999
  • ISBN
    0819431524
  • Text Lang
    en
  • Country Code
    us
  • Title Language Code
    en
  • Place of Publication
    • Bellingham, Wash., USA
  • Data Source
    • CiNii Books
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