Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
CiNii
Available at 2 libraries
Bibliographic Information
- Title
- "Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California"
- Statement of Responsibility
- chair/editor Will Conley ; sponsored and published by SPIE--the International Society for Optical Engineering
- Publisher
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- SPIE
- Publication Year
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- c1999
- Book size
- 28 cm
- Series Name / No
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- : set
- Other Title
-
- Advances in resist technology and processing XVI : microlithography 1999 : 15-17 March 1999, Santa Clara, California
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Notes
Includes bibliographical references and index
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Details 詳細情報について
-
- CRID
- 1130000797087699072
-
- NII Book ID
- BA45995999
-
- ISBN
- 0819431524
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- Text Lang
- en
-
- Country Code
- us
-
- Title Language Code
- en
-
- Place of Publication
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- Bellingham, Wash., USA
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- Data Source
-
- CiNii Books