Physics and technology of high-k gate dielectrics

CiNii Available at 2 libraries

Bibliographic Information

Title
"Physics and technology of high-k gate dielectrics"
Statement of Responsibility
editors, S. Kar ... [et al.] ; sponsoring divisions: Dielectric Science and Technology, Electronics and Photonics
Publisher
  • Electrochemical Society
Publication Year
  • c2006-
Book size
23 cm
Series Name / No
  • 3
  • 4
  • 5
  • 6
Other Title
  • Dielectric and semiconductor materials, devices, and processing

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Notes

v. 3: "... The Third International Symposium on High Dielectric Constant Gate Stacks, held in Los Angels, California, on October 17 -20, 2005. ..."--p. iii

v. 4: "... The Forth International Symposium on High Dielectric Constant Gate Stacks, to be held in Cancun, Mexico on October 30 to November 03, 2006. ..."--p. iii

v. 5:"... The Fifth International Symposium on High Dielectric Constant Materials and Gate Stacks, held in Washington, DC from October 8 to 10, 2007."--preface

v. 6:"... The sixth International Symposium on High Dielectric Constant Materials and Gate Stacks, held in Honolulu, Hawaii, October 13 to 15, 2008."--preface

v. 3: xi, 801 p. ; v. 4: xiv, 547 p. ; v. 5: xi, 660 p. ; v. 6: xv, 530 p.

Includes bibliographical references and indexes

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Details 詳細情報について

  • CRID
    1130000797297632256
  • NII Book ID
    BA8073444X
  • ISBN
    1566774446
    1566775035
    9781566775700
    9781566776516
  • Text Lang
    en
  • Country Code
    us
  • Title Language Code
    en
  • Place of Publication
    • Pennington, N.J.
  • Data Source
    • CiNii Books
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