Physics and technology of high-k gate dielectrics
書誌事項
- タイトル
- "Physics and technology of high-k gate dielectrics"
- 責任表示
- editors, S. Kar ... [et al.] ; sponsoring divisions: Dielectric Science and Technology, Electronics and Photonics
- 出版者
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- Electrochemical Society
- 出版年月
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- c2006-
- 書籍サイズ
- 23 cm
- シリーズ名/番号
-
- 3
- 4
- 5
- 6
- タイトル別名
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- Dielectric and semiconductor materials, devices, and processing
この図書・雑誌をさがす
注記
v. 3: "... The Third International Symposium on High Dielectric Constant Gate Stacks, held in Los Angels, California, on October 17 -20, 2005. ..."--p. iii
v. 4: "... The Forth International Symposium on High Dielectric Constant Gate Stacks, to be held in Cancun, Mexico on October 30 to November 03, 2006. ..."--p. iii
v. 5:"... The Fifth International Symposium on High Dielectric Constant Materials and Gate Stacks, held in Washington, DC from October 8 to 10, 2007."--preface
v. 6:"... The sixth International Symposium on High Dielectric Constant Materials and Gate Stacks, held in Honolulu, Hawaii, October 13 to 15, 2008."--preface
v. 3: xi, 801 p. ; v. 4: xiv, 547 p. ; v. 5: xi, 660 p. ; v. 6: xv, 530 p.
Includes bibliographical references and indexes
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詳細情報 詳細情報について
-
- CRID
- 1130000797297632256
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- NII書誌ID
- BA8073444X
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- ISBN
- 1566774446
- 1566775035
- 9781566775700
- 9781566776516
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- 本文言語コード
- en
-
- 出版国コード
- us
-
- タイトル言語コード
- en
-
- 出版地
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- Pennington, N.J.
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- データソース種別
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- CiNii Books