Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.

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Bibliographic Information

Title
"Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A."
Statement of Responsibility
editors, H.R. Huff ... [et al.]
Publisher
  • Materials Research Society
Publication Year
  • 1999
Book size
24 cm

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Notes

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