Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California
Bibliographic Information
- Title
- "Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California"
- Statement of Responsibility
- sponsored and published by SPIE--the International Society for Optical Engineering ; Susan K. Jones, chair/editor
- Publisher
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- SPIE
- Publication Year
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- 1996
- Book size
- 28 cm
- Series Name / No
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- pbk.
- Other Title
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- Metrology, inspection, and process control for microlithography 10
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Notes
"This volume contains the origianl papers presented at the tenth annual SPIE Conference on Metrology, Inspection, and Process Control for Microlithography"--Introd
Includes bibliographical references
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Details 詳細情報について
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- CRID
- 1130006265935321764
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- NII Book ID
- BC06662844
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- ISBN
- 0819421014
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- LCCN
- 95072314
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- Web Site
- https://lccn.loc.gov/95072314
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- Text Lang
- en
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- Country Code
- us
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- Title Language Code
- en
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- Place of Publication
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- Bellingham, WA
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- Data Source
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- CiNii Books