Advanced gate stack, source/drain, and channel engineering for si-based CMOS 6 : new materials, processes, and equipment
CiNii
Available at 1 libraries
Bibliographic Information
- Title
- "Advanced gate stack, source/drain, and channel engineering for si-based CMOS 6 : new materials, processes, and equipment"
- Statement of Responsibility
- editors, E.P. Gusev ... [et al.]
- Publisher
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- Electrochemical Society
- Publication Year
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- c2010
- Book size
- 23 cm
- Series Name / No
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- : hardcover
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Details 詳細情報について
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- CRID
- 1130009670188468623
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- NII Book ID
- BC12706988
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- ISBN
- 9781566777919
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- Text Lang
- en
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- Country Code
- us
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- Title Language Code
- en
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- Place of Publication
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- Pennington, N.J.
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- Data Source
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- CiNii Books