Electron-beam, x-ray, and ion-beam submicrometer lithographies for manufacturing II : 8-9 March 1992, San Jose, California

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Bibliographic Information

Title
"Electron-beam, x-ray, and ion-beam submicrometer lithographies for manufacturing II : 8-9 March 1992, San Jose, California"
Statement of Responsibility
Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering
Publisher
  • SPIE
Publication Year
  • c1992
Book size
28 cm

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Notes

Includes bibliographical references and index

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