Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions
Bibliographic Information
- Title
- "Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions"
- Statement of Responsibility
- edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood
- Publisher
-
- Noyes Publications
- Publication Year
-
- c1990
- Book size
- 25 cm
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Notes
Includes bibliographical references and index
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Details 詳細情報について
-
- CRID
- 1130282268959565696
-
- NII Book ID
- BA18754617
-
- ISBN
- 0815512201
-
- LCCN
- 89022834
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- Web Site
- https://lccn.loc.gov/89022834
-
- Text Lang
- en
-
- Country Code
- us
-
- Title Language Code
- en
-
- Place of Publication
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- Park Ridge, N.J.
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- Subject
-
- LCSH: Plasma engineering
- LCSH: Semiconductors -- Etching
- LCSH: Plasma etching
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- Data Source
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- CiNii Books
