Bibliographic Information
- Title
- "Submicron lithography"
- Statement of Responsibility
- Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society, March 29-30, 1982, Santa Clara, California
- Publisher
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- International Society for Optical Engineering
- Publication Year
-
- 1982
- Book size
- 28 cm
- Series Name / No
-
- pbk.
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Notes
Includes bibliographical references and indexes
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Details 詳細情報について
-
- CRID
- 1130282269153390464
-
- NII Book ID
- BA23966126
-
- ISBN
- 0892523689
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- LCCN
- 82060280
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- Web Site
- https://lccn.loc.gov/82060280
-
- Text Lang
- en
-
- Country Code
- us
-
- Title Language Code
- en
-
- Place of Publication
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- Bellingham, Wash.
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- Classification
-
- LCC: TK7874
- DC19: 621.381/74
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- Subject
-
- Data Source
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- CiNii Books