Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA
Bibliographic Information
- Title
- "Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA"
- Statement of Responsibility
- Elizabeth A. Dobisz, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
- Publisher
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- SPIE
- Publication Year
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- c2000
- Book size
- 28 cm
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Notes
Includes bibliographic references and index
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Details 詳細情報について
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- CRID
- 1130282269291033856
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- NII Book ID
- BA60711204
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- ISBN
- 0819436151
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- LCCN
- 2001267776
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- Web Site
- https://lccn.loc.gov/2001267776
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- Text Lang
- en
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- Country Code
- us
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- Title Language Code
- en
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- Place of Publication
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- Bellingham, Wash.
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- Classification
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- LCC: TK7874
- DC21: 621.3815/31
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- Data Source
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- CiNii Books