Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK

Name: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK
Author: Mack, Chris A., Stevenson, Tom, Society of Photo-optical Instrumentation Engineers, Scottish Enterprise, European Optical Society, Institution of Electrical Engineers

Mack, Chris A., Stevenson, Tom, Society of Photo-optical Instrumentation Engineers, Scottish Enterprise, European Optical Society, Institution of Electrical Engineers

Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK

CiNii Available at 2 libraries

Bibliographic Information

Title: "Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK"

Statement of Responsibility: Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK)

Publisher

SPIE

Publication Year

c2001

Book size: 28 cm

Search this Book/Journal

Notes

Includes bibliographic references and author index

Related Books

Details 詳細情報について

CRID: 1130282269314038016

NII Book ID: BA61058008

ISBN: 0819441058

Text Lang: en

Country Code: us

Title Language Code: en

Place of Publication

Bellingham, Wash.

Subject

LCSH: Integrated circuits -- Very large scale integration -- Congresses
LCSH: Printed circuits -- Congresses
LCSH: Lithography -- Congresses

Data Source

CiNii Books

Export