Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California
Bibliographic Information
- Title
- "Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California"
- Statement of Responsibility
- Phillip D. Blais, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group
- Publisher
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- SPIE
- Publication Year
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- c1983
- Book size
- 28 cm
- Series Name / No
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- pbk.
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Notes
Includes bibliographical references and index
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Details 詳細情報について
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- CRID
- 1130282269764494208
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- NII Book ID
- BA23970906
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- ISBN
- 0892524286
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- LCCN
- 83061531
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- Web Site
- https://lccn.loc.gov/83061531
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- Text Lang
- en
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- Country Code
- us
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- Title Language Code
- en
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- Place of Publication
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- Bellingham, Wash., USA
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- Classification
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- LCC: TK7874
- DC19: 621.3815/2
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- Subject
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- LCSH: Lithography, Electron beam
- LCSH: X-ray lithography
- LCSH: Ion beam lithography
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- Data Source
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- CiNii Books