Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California

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Bibliographic Information

Title
"Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California"
Statement of Responsibility
Phillip D. Blais, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group
Publisher
  • SPIE
Publication Year
  • c1983
Book size
28 cm
Series Name / No
  • pbk.

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Notes

Includes bibliographical references and index

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