Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA
Bibliographic Information
- Title
- "Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA"
- Statement of Responsibility
- R. Scott Mackay, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH
- Publisher
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- SPIE
- Publication Year
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- c2005
- Book size
- 28 cm
- Series Name / No
-
- pt. 1
- pt. 2
- Other Title
-
- Emerging lithographic technologies 9
- Emerging lithographic technologies nine
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Notes
Includes bibliographical references and author index
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Details 詳細情報について
-
- CRID
- 1130282269903092736
-
- NII Book ID
- BA86033459
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- ISBN
- 0819457310
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- LCCN
- 2006271122
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- Web Site
- https://lccn.loc.gov/2006271122
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- Text Lang
- en
-
- Country Code
- us
-
- Title Language Code
- en
-
- Place of Publication
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- Bellingham, Wash.
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- Classification
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- LCC: TK7874
- DC22: 621.3815/31
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- Data Source
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- CiNii Books