Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA
Bibliographic Information
- Title
- "Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA"
- Statement of Responsibility
- Lars W. Liebmann, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH
- Publisher
-
- SPIE
- Publication Year
-
- c2005
- Book size
- 28 cm
Search this Book/Journal
Notes
Includes bibliographical references and author index
- Tweet
Details 詳細情報について
-
- CRID
- 1130282270211791744
-
- NII Book ID
- BA86008236
-
- ISBN
- 0819457361
-
- LCCN
- 2006272389
-
- Web Site
- https://lccn.loc.gov/2006272389
-
- Text Lang
- en
-
- Country Code
- us
-
- Title Language Code
- en
-
- Place of Publication
-
- Bellingham, Wash.
-
- Subject
-
- LCSH: Integrated circuits -- Design and construction -- Congresses
- LCSH: Integrated circuits -- Defects -- Analysis -- Congresses
- LCSH: Semiconductors -- Design and construction -- Congresses
- LCSH: Semiconductor wafers -- Defects -- Analysis -- Congresses
- LCSH: Microelectronics industry -- Quality control -- Congresses
- LCSH: Quality control -- Congresses
-
- Data Source
-
- CiNii Books