Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California

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Bibliographic Information

Title
"Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California"
Statement of Responsibility
Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering
Publisher
  • SPIE
Publication Year
  • c1991
Book size
28 cm

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Notes

"Part of a two-conference program ... held at the SPIE Symposium on Microlithography, 3-8 March 1991"--P. viii

Includes bibliographical references and index

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