Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California
Bibliographic Information
- Title
- "Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California"
- Statement of Responsibility
- Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering
- Publisher
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- SPIE
- Publication Year
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- c1991
- Book size
- 28 cm
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Notes
"Part of a two-conference program ... held at the SPIE Symposium on Microlithography, 3-8 March 1991"--P. viii
Includes bibliographical references and index
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Details 詳細情報について
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- CRID
- 1130282270249156096
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- NII Book ID
- BA17140471
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- ISBN
- 0819405647
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- LCCN
- 91061058
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- Web Site
- https://lccn.loc.gov/91061058
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- Country Code
- us
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- Title Language Code
- en
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- Place of Publication
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- Bellingham, Wash.
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- Classification
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- LCC: TK7874
- DC20: 621.3815/2
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- Subject
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- Data Source
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- CiNii Books