EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany
Bibliographic Information
- Title
- "EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany"
- Statement of Responsibility
- Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI--the Society for Microelectronics, Micro- and Precision Engineering (Germany) [and] Institute for Microstructure Technology/Forschungszentrum Karlsruhe (Germany) ; cooperating organizations, SEMI Europe ... [et al.] ; copublished by, SPIE--the International Society for Optical Engineering and VDE Verlag GmbH (Germany)
- Publisher
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- SPIE
- VDE Verlag GmbH
- Publication Year
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- c2005
- Book size
- 28 cm
- Other Title
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- European Mask and Lithography Conference
- European Conference on Mask Technology for Integrated Circuits and Microcomponents
- Mask and lithography
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Notes
Includes bibliographical references and author index
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Details 詳細情報について
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- CRID
- 1130282271343889152
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- NII Book ID
- BA8605470X
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- ISBN
- 0819458309
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- LCCN
- 2006273846
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- Web Site
- https://lccn.loc.gov/2006273846
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- Text Lang
- en
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- Country Code
- us
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- Title Language Code
- en
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- Place of Publication
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- Bellingham, Wash.,
- Berlin, Germany
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- Classification
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- LCC: TK7872.M3
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- Subject
-
- Data Source
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- CiNii Books