Developments in semiconductor microlithography, June 1-3, 1976, San Jose, California

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Bibliographic Information

Title
"Developments in semiconductor microlithography, June 1-3, 1976, San Jose, California"
Statement of Responsibility
Donald E. Routh ... [et al.], editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with National Aeronautics and Space Administration, International Society for Hybrid Microelectronics
Publisher
  • Society of Photo-optical Instrumentation Engineers
Publication Year
  • c1976
Book size
28 cm

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Notes

Includes bibliographical references and indexes

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